MRS Bulletin Volume 37, Number4, 2012 : C2

CUSTOMIZED PRODUCTION ION IMPLANTERS Beam energies from 10 keV up to several 10s of MeV Beam currents from 100 micro-amps up to several milliamps Ion species, including H, He, B, P, As and others Single wafer or batch processing of wafers up to and including 8” In-air or in-vacuum cassette-to-cassette wafer handling Electrostatic and/or mechanical wafer clamping High Voltage Engineering High Voltage Engineering Europa B.V. P.O. Box 99, 3800 AB Amersfoort, The Netherlands Tel: 31 33 4619741 t info@highvolteng.com www.highvolteng.com